Hakuto全自动离子刻蚀机MEL3100 用于刻蚀薄膜磁盘-益择网-专业的仪器网上选购商城

某薄膜磁盘制造采用Hakuto 全自动离子刻蚀机 MEL3100 用于刻蚀薄膜磁盘, 去除溅射镀制磁盘薄膜的污染物和提高薄膜的均匀性.

Hakuto 全自动离子刻蚀机 MEL 3100 技术参数:

portant;"> Model		portant;"> MEL3100	portant;">	portant;"> Main body
portant;"> Wafer size		portant;"> 3"～6"	portant;">	portant;"> Power Supply	portant;"> AC200V 3ph 40A
portant;"> Wafer per batch		portant;"> 1 wafer	portant;">	portant;"> Power Supply	portant;"> *two lines
portant;"> Cassette	portant;"> No.	portant;"> 25 wafers	portant;">	portant;"> Cooling Water	portant;"> 15 (l/min)
portant;"> Cassette	portant;"> Q‘ty	portant;"> 1pc.	portant;">	portant;"> Cooling Water	portant;"> <20℃
portant;"> Throughput		portant;"> 10 (wafer/hr) *1	portant;">	portant;"> CDA	portant;"> 0.5 (MPa)
portant;"> Pressure	portant;"> Ultimate	portant;"> 8×10-5 (Pa) *2	portant;">	portant;"> CDA	portant;"> >10 (l/min)
portant;"> Pressure	portant;"> Process	portant;"> 2×10-2 (Pa) *2	portant;">	portant;"> N2	portant;"> 0.2 (MPa)
portant;"> Etching	portant;"> Rate	portant;"> >10 (nm/min)@SiO2 *3	portant;">	portant;"> N2	portant;"> >40 (l/min)
portant;"> Etching	portant;"> Uniformity	portant;"> ±5%@132mm (6") *3	portant;">	portant;"> Ar	portant;"> 0.2 (MPa)
portant;"> Wafer surface temp.		portant;"> <100℃ *3	portant;">	portant;"> Ar	portant;"> 20 (sccm)
portant;"> Stage rotating		portant;"> 1～20 (rpm) ±5%	portant;">	portant;"> He	portant;"> 0.2 (MPa)
portant;"> Stage tilting		portant;"> ±90°±0.5°	portant;">	portant;"> He	portant;"> 20 (sccm)
portant;"> Dimension W×D×H (mm)	portant;"> Main body	portant;"> 1,600×2,175×1,900	portant;">	portant;"> *need additional utilities for Dry pump
	portant;"> Co***oller	portant;"> 640×610×1,900	portant;">	portant;"> *need additional utilities for Dry pump
	portant;"> Chiller	portant;"> 555×515×1,025	portant;">	portant;">	portant;">
portant;"> Weight (kg)	portant;"> Main body	portant;"> 1,700	portant;">	portant;">	portant;">
	portant;"> Co***oller	portant;"> 200	portant;">	portant;">	portant;">
	portant;"> Chiller	portant;"> 100	portant;">	portant;">	portant;">
portant;"> *1: Estimated process time 5min			portant;">	portant;">	portant;">
portant;"> *2: No wafer on stege / process chamber			portant;">	portant;">	portant;">
portant;"> *3: Depending on process			portant;">	portant;">	portant;">

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Hakuto全自动离子刻蚀机MEL3100 用于刻蚀薄膜磁盘

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